Summary of High Throughput Methods for Study of Thin Film Alloys

He Zhang

doi:10.62051/t8myqm76

Authors

He Zhang

DOI:

https://doi.org/10.62051/t8myqm76

Keywords:

Thin Film Materials; High-throughput Techniques; Ta-Ti Alloys.

Abstract

In the fields of semiconductor and electronics, fine processing at the micro and nanoscale is crucial. Thin film materials are an important part of this fine processing and their small molecular structure, ranging from microns to nanometers, is directly linked to achieving high throughput. Breakthroughs in thin film materials have accelerated research on high throughput systems and ultimately enabled mass production.

Downloads

Download data is not yet available.

References

Mardare, A. I., Savan, A., Ludwig, A., Wieck, A. D., & Hassel, A. W. (2007). A combinatorial passivation study of Ta-Ti alloys. Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Str. 1, 40237 Düsseldorf, Germany: Ruhr-Universität Bochum.

R. Zarnetta, A. Savan, S. Thienhaus, A. Ludwig, et al. Combinatorial study of phase transformation characteristics of a Ti-Ni-Pd shape memory thin film composition spread in view of microactuator applications. 62.20.Fe; 64.70.Kb; 81.30.Kf.

Löbel, R., Thienhaus, S., Savan, A., Ludwig, A. (a, b). Combinatorial fabrication and high-throughput characterization of a Ti-Ni-Cu shape memory thin film composition spread. Combinatorial Material Science group, Caesar, Ludwig-Erhard-Allee 2, 53175 Bonn, Germany; Ruhr-University Bochum, Institute of Materials, 44780 Bochum, Germany. Received 28 June 2006; received in revised form 26 January 2007; accepted 8 February 2007.